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Implementation of a scalable VBIC model for SiGe:C HBTs

机译:用于SiGe:C HBT的可扩展VBIC模型的实现

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This work examines the utility of semi-physical vertical bipolar inter-company (VBIC) model for the first time to develop for an accurate, easy and fast scaling methodology for high-frequency SiGe:C heterojunction bipolar transistors (HBTs) with a peak f_T of 75 GHz fabricated in a low-cost BiCMOS technology. The methodology allows one to find transistor models from single-finger transistor to multi-finger and variable length emitter devices with a minimal parameter extraction procedure. The devices modeled include several base-emitter structures in parallel, on top of a single collector to obtain different transistor area. The scaling rules are given in detail. Using this methodology, scalable VBIC model parameters were generated to describe the DC and RF behavior of SiGe:C HBTs up to peak f_T and f_(max) within ±10% accuracy. The key advantage of this methodology is that one does not need any special test structure while keeping the extraction procedure simple and fast.
机译:这项工作首次检验了半物理垂直双极公司间(VBIC)模型的实用性,旨在为峰值为f_T的高频SiGe:C异质结双极晶体管(HBT)开发一种准确,便捷的缩放方法采用低成本BiCMOS技术制造的75 GHz天线。该方法允许人们以最少的参数提取程序找到从单指晶体管到多指和可变长度发射极器件的晶体管模型。建模的器件在单个集电极的顶部包括多个并行的基极-发射极结构,以获得不同的晶体管面积。详细给出了缩放规则。使用这种方法,生成了可扩展的VBIC模型参数,以描述SiGe:C HBT的DC和RF行为,精度达到±10%的峰值f_T和f_(max)。这种方法的主要优点是,在保持提取过程简单,快速的同时,不需要任何特殊的测试结构。

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