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Electroabsorption modulator performance predicted from band-edge absorption spectra of bulk, quantum-well, and quantum-well-intermixed InGaAsP structures

机译:根据块状,量子阱和量子阱混合的InGaAsP结构的带边吸收光谱预测的电吸收调制器性能

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Band-edge absorption spectra from bulk, quantum-well, and quantum-well-intermixed InGaAsP material are collected and compared using photocurrent spectroscopy. The expected performances of ideal electroabsorption modulators fabricated from these materials are predicted and compared using the band-edge absorption data. A graphical method for simultaneously considering chirp, insertion-loss, extinction-ratio, and tuning range is presented, and is used to compare the suitability of the various materials for electroabsorption modulator applications. The quantum-well material is shown to be superior to bulk material for most EAM applications. Quantum wells with 85 meV conduction band depth and 80 A width are shown to be superior to quantum wells with 120 meV conduction band depth and 65 A width. Both well designs exhibit strong excitons. Finally, the effect of quantum-well intermixing is considered, and the expected performances of quantum-well-intermixed electroabsorption modulators are presented.
机译:收集了块状,量子阱和量子阱混合的InGaAsP材料的带边吸收光谱,并使用光电流光谱法进行了比较。由这些材料制成的理想电吸收调制器的预期性能可以通过带边吸收数据进行预测和比较。提出了同时考虑chi,插入损耗,消光比和调谐范围的图形方法,该方法用于比较各种材料在电吸收调制器应用中的适用性。对于大多数EAM应用而言,量子阱材料被证明优于本体材料。已显示具有85 meV导带深度和80 A宽度的量子阱优于具有120 meV导带深度和65 A宽度的量子阱。两种井设计均显示强激子。最后,考虑了量子阱混合的影响,并给出了量子阱混合的电吸收调制器的预期性能。

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