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Proton-induced SEU in SiGe digital logic at cryogenic temperatures

机译:低温下SiGe数字逻辑中质子诱导的SEU

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We present the first experimental results confirming the increased SEE sensitivity of SiGe digital bipolar logic circuits operating in a 63 MeV proton environment at cryogenic temperatures. A 3x increase in both the error-event and bit-error cross sections is observed as the circuits are cooled from 300 K to 77 K, with error signature analyses indicating corresponding increases in the average number of bits-in-error and error length over data rates ranging from 50 Mbit/s to 4 Gbit/s. Single-bit-errors dominate the proton-induced SEU response at both 300 K and 77 K, as opposed to the multiple-bit-errors seen in the heavy-ion SEU response. Temperature dependent substrate carrier lifetime measurements, when combined with calibrated 2 D DESSIS simulations, suggest that the increased transistor charge collection at low temperature is a mobility driven phenomenon. Circuit-level RHBD techniques are shown to be very efficient in mitigating the proton- induced SEU at both 300 K and 77 K over the data rates tested. These results suggest that the circuit operating temperature must be carefully considered during component qualification for SEE tolerance and indicate the need for broad-beam heavy-ion testing at low temperatures.
机译:我们提出了第一个实验结果,证实了在低温下在63 MeV质子环境中运行的SiGe数字双极逻辑电路的SEE灵敏度提高了。当电路从300 K冷却到77 K时,观察到错误事件和误码错误的横截面都增加了3倍,错误签名分析表明平均误码位数和错误长度相应增加了数据速率范围从50 Mbit / s到4 Gbit / s。与重离子SEU响应中看到的多位错误相反,在300 K和77 K时,单位错误主导着质子诱导的SEU反应。与温度相关的基板载流子寿命测量结果,与经过校准的2D DESSIS模拟相结合,表明在低温下增加的晶体管电荷收集是迁移率驱动的现象。电路级RHBD技术在缓解300 K和77 K的质子诱导SEU方面,在测试数据速率方面非常有效。这些结果表明,在对SEE公差进行元件鉴定时必须仔细考虑电路的工作温度,并表明需要在低温下进行宽束重离子测试。

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