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An InP/InGaAs/InP DHBT with high power density at Ka-band

机译:在Ka波段具有高功率密度的InP / InGaAs / InP DHBT

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An InP/InGaAs/InP double heterojunction bipolar transistor was fabricated and its Ka-band power performance characterized. The device employed a 30 nm highly doped InGaAs base, and a 150 nm collector with an InAlGaAs linearly graded at the base-collector junction to prevent current blocking and maintain breakdown voltage. The dc current gain is 28.4 at a current density of J_C = 666 kA/cm~2 and the breakdown voltage (BV_(ceo)) is larger than 5 V. A submicrometer InP/InGaAs DHBT with an emitter size of 0.6 × 12 μm~2 demonstrated a maximum cutoff frequency (f_Τ) of 230 GHz, and a maximum output power density of 3.7 mW/μm~2 at 29 GHz.
机译:制备了InP / InGaAs / InP双异质结双极晶体管,并表征了其Ka波段功率性能。该器件采用了30 nm高掺杂InGaAs基极,以及在基极-集电极结处线性分级的InAlGaAs 150 nm集电极,以防止电流阻塞并维持击穿电压。在J_C = 666 kA / cm〜2的电流密度下,直流电流增益为28.4,击穿电压(BV_(ceo))大于5V。亚微米InP / InGaAs DHBT的发射器尺寸为0.6×12μm 〜2展示了230 GHz的最大截止频率(f_Τ),在29 GHz时的最大输出功率密度为3.7 mW /μm〜2。

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