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Explicit compact model for symmetric double-gate MOSFETs including solutions for small-geometry effects

机译:对称双栅极MOSFET的显式紧凑模型,包括小几何效应解决方案

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A physics-based compact model including short-channel effects (SCEs) is presented for undoped (or lightly doped) symmetric double-gate (DG) MOSFETs. Our approach allows an accurate description of the device behavior down to 60 nm with a simple set of equations. It is shown that the subthreshold current, the threshold voltage roll-off and the DIBL predicted by the analytical solution are in close agreement with 2-D numerical simulations performed with Atlas. The mobility degradation due to both transverse and longitudinal fields is taken into account but the channel length modulation (saturation regime) is not addressed in this paper. In order to demonstrate that the model is well-suited for circuit simulation, the results of the dynamic model based on an explicit formulation of the mobile charge density are also presented.
机译:针对未掺杂(或轻掺杂)的对称双栅(DG)MOSFET,提出了一种基于物理的紧凑模型,其中包括短沟道效应(SCE)。我们的方法可以通过一组简单的方程式精确描述低至60 nm的器件行为。结果表明,分析解决方案预测的亚阈值电流,阈值电压下降和DIBL与Atlas进行的二维数值模拟非常吻合。考虑了由于横向和纵向场引起的迁移率降低,但本文未解决通道长度调制(饱和状态)。为了证明该模型非常适合电路仿真,还给出了基于移动电荷密度的明确公式表示的动态模型的结果。

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