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Low-voltage Scaling Limitations For Nano-scale Cmos Lsis

机译:纳米级Cmos Lsis的低压缩放限制

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摘要

The minimum operating voltage (V_(min)) of nano-scale LSIs is investigated, focusing on logic gates, SRAM cells, and DRAM sense amplifiers in LSIs. The V_(min), which is governed by SRAM cells, rapidly increases as devices are miniaturized due to the ever-larger variations in the threshold voltage (V_T) of MOSFETs. The V_(min), however, is reduced to the sub-l-V region by using repair techniques and new MOSFETs (e.g., FD-SOls and/or high-k metal gates) that can reduce V_T variations.
机译:研究了纳米级LSI的最小工作电压(V_(min)),重点是LSI中的逻辑门,SRAM单元和DRAM读出放大器。由于MOSFET阈值电压(V_T)的变化越来越大,因此随着器件的小型化,由SRAM单元控制的V_(min)迅速增加。但是,通过使用修复技术和可以减小V_T变化的新型MOSFET(例如FD-SO1和/或高k金属栅极),将V_(min)减小到低于L-V的区域。

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