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Backscattering Coefficient And Drift-diffusion Mobility Extraction In Short Channel Mos Devices

机译:短通道Mos装置的背向散射系数和漂移扩散迁移率提取

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摘要

A new method for the extraction of the backscattering coefficient in nanoMOS devices has been demonstrated. The method, which relies on mobility measurements in linear operation, proves very simple and reliable for the determination of the ballistic rate of transport. Moreover, it allows to obtain the drift-diffusion mobility corrected from ballistic effects and therefore to make a diagnostic of the scattering mechanisms at small gate length.
机译:已经证明了提取纳米MOS器件中反向散射系数的新方法。该方法依赖于线性操作中的迁移率测量,被证明对于确定弹道运输速度非常简单和可靠。此外,它允许获得从弹道效应校正的漂移-扩散迁移率,因此可以在小浇口长度下对散射机理进行诊断。

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