首页> 外文期刊>Solid-State Electronics >Application of advanced 200 GHz Si-Ge HBTs for high dose radiation environments
【24h】

Application of advanced 200 GHz Si-Ge HBTs for high dose radiation environments

机译:先进的200 GHz Si-Ge HBT在高剂量辐射环境中的应用

获取原文
获取原文并翻译 | 示例
       

摘要

Third generation 200 GHz silicon-germanium Heterojunction Bipolar Transistors (Si-Ge HBTs) were irradiated with high dose Co-60 gamma radiation up to 100 Mrad. Pre-radiation and post-radiation DC figures of merits were used to quantify the radiation tolerance of the different geometry devices. The different electrical characteristics like Gummel measurements, excess base current, current gain, trans-conductance, neutral base recombination, avalanche multiplication of carriers and output characteristics were studied for different doses from 100 krad to 100 Mrad of total doses. The Si-Ge HBTs showed robust ionizing radiation tolerance up to a total dose of 100 Mrad.
机译:第三代200 GHz硅锗异质结双极晶体管(Si-Ge HBT)用高达60 Mrad的高剂量Co-60γ射线辐照。辐射前和辐射后DC的优值被用于量化不同几何形状设备的辐射容限。对于总剂量从100 krad到100 Mrad的不同剂量,研究了不同的电气特性,例如Gummel测量,过量基极电流,电流增益,跨导,中性基极重组,载流子的雪崩倍增和输出特性。 Si-Ge HBT表现出强大的电离辐射耐受性,总剂量高达100 Mrad。

著录项

  • 来源
    《Solid-State Electronics》 |2010年第12期|p.1554-1560|共7页
  • 作者单位

    Department of Studies in Physics, University of Mysore, Manasagangotri, Mysore 570 006, Kamataka. India;

    Department of Studies in Physics, University of Mysore, Manasagangotri, Mysore 570 006, Kamataka. India;

    Integrated Circuits Division, Bharat Electronics Limited, Bangalore 560 013, Kamataka, India;

    Department of Physics, Pondicherry University, Puducherry 60S 014, India;

    School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta 30332, USA;

    Department of Studies in Physics, University of Mysore, Manasagangotri, Mysore 570 006, Kamataka. India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Si-Ge HBT; high dose gamma irradiation; Gf_r traps; e-b spacer oxide; ST1 oxide; transconductance;

    机译:Si-Ge HBT;大剂量伽马射线照射;Gf_r陷阱;e-b间隔氧化物;ST1氧化物;跨导;
  • 入库时间 2022-08-18 01:34:57

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号