机译:溅射压力对掺铝ZnO薄膜形貌,力学和电学性能的影响
Department of Materials Science and Engineering, Yonsei University, 134 Shinchon-Dong, Seoul 120-749, Republic of Korea;
rnDepartment of Materials Science and Engineering, Yonsei University, 134 Shinchon-Dong, Seoul 120-749, Republic of Korea;
rnDepartment of Materials Science and Engineering, Yonsei University, 134 Shinchon-Dong, Seoul 120-749, Republic of Korea;
rnSNTEK Co., Ltd., 906 Hakwoon-Ri, Kimpo-Shi, Gyeonggi-Do 415-843, Republic of Korea;
rnSNTEK Co., Ltd., 906 Hakwoon-Ri, Kimpo-Shi, Gyeonggi-Do 415-843, Republic of Korea;
rnSchool ofNano & Advanced Materials Engineering, Changwon National University, 9 Sarim-Dong, Changwon, Cyoungnam 641-773, Republic of Korea;
rnDepartment of Multimedia-System Engineering, University oflncheon, 12-1 Songdo-Dong, Incheon 406-772, Republic of Korea;
rnDepartment of Materials Science and Engineering, Yonsei University, 134 Shinchon-Dong, Seoul 120-749, Republic of Korea;
ZnO; thin film; doping; sputtering; transparent conductive oxide;
机译:射频功率对射频磁控溅射沉积铝掺杂ZnO薄膜结构,形貌,电学,组成和光学性质的影响
机译:氧分压对离子束共溅射法制备Al掺杂ZnO薄膜结构,电学和光学性能的影响
机译:ZnO帽层形态对Al掺杂ZnO膜的电性能和热稳定性的影响
机译:沉积参数对磁控共溅射Al掺杂ZNO薄膜元素浓度,电学和光学性能的影响
机译:退火温度对Sol-Gel ZnO薄膜力学性能的影响。
机译:氧溅射压力对气敏性ZnO薄膜结构形貌和光学性质的影响
机译:磁控溅射沉积al掺杂ZnO薄膜:溅射参数对电学和光学性能的影响