机译:三栅极SOI MOSFET的低维效应的可变温度特性
Nanotechnology Croup, Tyndall National Institute, Lee Mattings, Prospect Row, Cork, Ireland;
Silicon Research Croup, Tyndall National Institute, Lee Maltings, Prospect Row, Cork, Ireland;
rnNanotechnology Croup, Tyndall National Institute, Lee Mattings, Prospect Row, Cork, Ireland;
Texas Instruments Inc., 13121 TI Boulevard, Dallas, TX 75243, USA;
rnSilicon Research Croup, Tyndall National Institute, Lee Maltings, Prospect Row, Cork, Ireland;
rnNanotechnology Croup, Tyndall National Institute, Lee Mattings, Prospect Row, Cork, Ireland;
silicon on insulator technology; MOSFETs; cryogenic electronics; semiconductor device measurements; quantum wires; charge carrier mobility; one-dimensional electron gases; ballistic conductors; silicon nanowire MOSFETs;
机译:Pi-Gate SOI MOSFET的室温低尺寸效应
机译:纳米级三门SOI MOSFET中自加热效应电热液面的影响
机译:包含量子效应的纳米级三栅极SOI MOSFET的新分析模型
机译:可变鳍尺寸的三栅SOI nMOSFET的双轴+单轴应力有效性
机译:4H-碳化硅MOSFET的建模和表征:高场,高温和瞬态效应。
机译:房间温度Terhertz天线耦合钻孔SOI基温度传感器的性能比较:MOSFETPN结二极管和电阻器
机译:蚀刻工艺对UTSOI表征伪MOSFET性能的影响