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The benefits and current progress of SiC SGTOs for pulsed power applications

机译:SiC SGTO在脉冲功率应用中的优势和当前进展

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摘要

Silicon Carbide (SiC) is an extremely attractive material for semiconductor power devices because of its electrical and physical characteristics. This paper describes the benefits of utilizing SiC Super Gate Turn-Off thyristors (SGTO) in pulsed power applications, reviews the current progress and development of SiC GTOs, and presents the static and pulsed characteristics of large area GTOs with high blocking capabilities. The wide pulsed evaluation of the 0.5 cm~2 SiC SGTOs has been demonstrated and reported by the Army Research Laboratory (ARL). This paper presents the wide pulsed capabilities of the 1 cm~2 SiC SGTOs. The 1 cm~2 SiC SGTO devices handled up to twice the peak current of the 0.5 cm~2 SiC SGTOs at a 1 ms pulse width. The wide pulsed evaluation of these devices was demonstrated at ARL ARL evaluated the static and pulsed characteristics of six of these devices. The devices had a forward blocking voltage rating of 9 kV and a trigger requirement of a negative pulse of 1 A to the gate for a millisecond pulse width. These devices were pulsed as high as 3.5 kA at 1 ms, equating to an action rate of 6 × 10~3 A~2 s and a current density of 4.8 kA/cm~2, based on the device active area. The narrow pulsed evaluation of this device has been demonstrated by Cree Inc. A peak current of 12.8 kA with a pulse width of 17 μs (corresponding to 12.8 kA/cm~2 based on the chip size) was conducted with this device.
机译:由于碳化硅(SiC)的电气和物理特性,它是半导体功率器件极具吸引力的材料。本文介绍了在脉冲功率应用中利用SiC超级栅极关断晶闸管(SGTO)的好处,回顾了SiC GTO的最新进展和发展,并介绍了具有高阻断能力的大面积GTO的静态和脉冲特性。陆军研究实验室(ARL)已证明并报道了0.5 cm〜2 SiC SGTO的宽脉冲评估。本文介绍了1 cm〜2 SiC SGTO的宽脉冲能力。 1 cm〜2 SiC SGTO器件在1 ms脉冲宽度下处理的峰值电流是0.5 cm〜2 SiC SGTO的两倍。在ARL上展示了这些设备的广泛脉冲评估,ARL评估了其中六个设备的静态和脉冲特性。这些器件的正向阻断电压额定值为9 kV,触发要求向栅极施加1 A的负脉冲,持续时间为毫秒脉冲宽度。这些器件在1 ms时被脉冲高达3.5 kA的脉冲,相当于6×10〜3 A〜2 s的动作速率和4.8 kA / cm〜2的电流密度(基于设备的有效面积)。 Cree Inc.已经证明了该器件的窄脉冲评估。用该器件进行了峰值电流12.8 kA和17μs的脉冲宽度(对应于芯片尺寸为12.8 kA / cm〜2)。

著录项

  • 来源
    《Solid-State Electronics》 |2010年第10期|P.1232-1237|共6页
  • 作者单位

    Army Research Laboratory, 2800 Powder Mill Rd., Adelphi, MD 20783, USA;

    Army Research Laboratory, 2800 Powder Mill Rd., Adelphi, MD 20783, USA;

    Army Research Laboratory, 2800 Powder Mill Rd., Adelphi, MD 20783, USA;

    Army Research Laboratory, 2800 Powder Mill Rd., Adelphi, MD 20783, USA;

    Berkeley Research Associates, 6557 Mid Cities Avenue, Beltsville, MD 20705, USA;

    Cree Inc., 4600 Silicon Drive, Durham, JVC 27703, USA;

    Cree Inc., 4600 Silicon Drive, Durham, JVC 27703, USA;

    Cree Inc., 4600 Silicon Drive, Durham, JVC 27703, USA;

    Silicon Power Corporation, 958 Main Street, Clifton Park, NY 12065, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    SiC GTOs; pulsed power; carrier lifetime; basal plane dislocation; micropipe;

    机译:SiC GTO;脉冲功率载流子寿命基底平面脱位;微管;

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