机译:掺氟对含HfTiON介质的Ge p-MOS电容器性能的影响
Department of Electrical & Electronic Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong;
Department of Electrical & Electronic Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong;
Department of Electrical & Electronic Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong;
Department of Electronic Science & Technology, Huazhong University of Science & Technology, China;
Ge; MOS; high-k dielectric; fluorine passivation;
机译:HfTiON介质在Ge p-MOS电容器中掺氟的研究
机译:Laon / Si双钝化层和氟等离子体处理改善HfTiON栅介电Ge MOS电容器的界面和电学性能
机译:NbON / Si双钝化层和掺氟改善HfLaON栅极介电Ge MOS电容器的界面和电学性能
机译:掺氟对具有La
机译:用于薄膜电容器的聚合物样氢化碳的合成及双不同电介质对高能密度应用电容器电性能的影响
机译:BaTiO3填料的粒径对电容器储能应用BaTiO3 /聚合物/ Al薄膜的制备和介电性能的影响
机译:氟掺入对La2O3栅介质硅mOs电容器电性能的影响