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InAs/AlSb HEMTs for cryogenic LNAs at ultra-low power dissipation

机译:InAs / AlSb HEMT用于超低功耗的低温LNA

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摘要

Properties of the InAs/AlSb high electron mobility transistor, essential for the design of a cryogenic low-noise amplifier (LNA) operating at low power dissipation, have been studied. Upon cooling from 300 K to 77 K, the dc transconductance gm was enhanced by 30% at a drain-source voltage VDS of 0.1 V. The gate current leakage showed a strong reduction of the Schottky current component at 77 K. Compared to 300 K, the cut-off frequency fT and maximum oscillation frequency?-max showed a significant improvement at 77 K with a peak ?-r(?-max) of 167 (142) GHz at VDs - 0.2 V. The suitability of the Sb HEMT for a cryogenic LNA design up to 50 GHz, operating at low dc power dissipation, was investigated through the extraction of the NF-(tot,min) figure of merit. It was found that the best device performance in terms of noise and gain is achieved at a low VDS of 0.16 V resulting in a minimum NFtot,min of 0.6 dB for a frequency of 10 GHz when operating at 77 K. A benchmarking between the Sb HEMT and an InP HEMT has been conducted highlighting the device improvement in noise and gain required to reach today's state-of-the-art cryogenic LNAs.
机译:已经研究了InAs / AlSb高电子迁移率晶体管的特性,这对于在低功耗下工作的低温低噪声放大器(LNA)的设计至关重要。从300 K冷却到77 K时,漏极-源极电压VDS为0.1 V时,直流跨导gm提高了30%。栅极电流泄漏显示77 K时肖特基电流分量大大降低。与300 K相比,截止频率fT和最大振荡频率ω-max在77 K时显示出显着的改善,在VDs-0.2 V时的峰值ω-r(ω-max)为167(142)GHz。Sb HEMT的适用性通过提取NF-(tot,min)品质因数,研究了在低dc功耗下工作的高达50 GHz的低温LNA设计。已经发现,在噪声和增益方面,最佳器件性能是在0.16 V的低VDS时实现的,当在77 K的频率下工作时,对于10 GHz的频率,NFtot,min的最小值最小为0.6 dB。已经进行了HEMT和InP HEMT的研究,重点介绍了达到当今最先进的低温LNA所需的设备噪声和增益方面的改进。

著录项

  • 来源
    《Solid-State Electronics》 |2011年第1期|p.47-53|共7页
  • 作者单位

    Microwave Electronics Laboratory, Department of Microtechnology and Nanosdence, Chalmers University of Technology, SE-412 96 COteborg, Sweden;

    rnMicrowave Electronics Laboratory, Department of Microtechnology and Nanosdence, Chalmers University of Technology, SE-412 96 COteborg, Sweden;

    rnMicrowave Electronics Laboratory, Department of Microtechnology and Nanosdence, Chalmers University of Technology, SE-412 96 COteborg, Sweden;

    rnInstitute of Electronics, Microelectronics and Nanotechnology, 1EMN/CNRS UMR 8520, University of Lille, Av. Poincare, 59652 Villeneuve d'Ascq, France;

    rnInstitute of Electronics, Microelectronics and Nanotechnology, 1EMN/CNRS UMR 8520, University of Lille, Av. Poincare, 59652 Villeneuve d'Ascq, France;

    rnInstitute of Electronics, Microelectronics and Nanotechnology, 1EMN/CNRS UMR 8520, University of Lille, Av. Poincare, 59652 Villeneuve d'Ascq, France;

    rnInstitute of Electronics, Microelectronics and Nanotechnology, 1EMN/CNRS UMR 8520, University of Lille, Av. Poincare, 59652 Villeneuve d'Ascq, France;

    rnInstitute of Electronics, Microelectronics and Nanotechnology, 1EMN/CNRS UMR 8520, University of Lille, Av. Poincare, 59652 Villeneuve d'Ascq, France;

    rnInstitute of Electronics, Microelectronics and Nanotechnology, 1EMN/CNRS UMR 8520, University of Lille, Av. Poincare, 59652 Villeneuve d'Ascq, France;

    rnInstitute of Electronics, Microelectronics and Nanotechnology, 1EMN/CNRS UMR 8520, University of Lille, Av. Poincare, 59652 Villeneuve d'Ascq, France;

    rnMicrowave Electronics Laboratory, Department of Microtechnology and Nanosdence, Chalmers University of Technology, SE-412 96 COteborg, Sweden;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    HEMT; Antimonide; InAs/AlSb; Low power; Low noise amplifier; Cryogenic; Microwave;

    机译:HEMT;锑化物InAs / AlSb;低电量;低噪声放大器;低温微波;

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