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A computationally efficient compact model for fully-depleted SOI MOSFETs with independently-controlled front- and back-gates

机译:具有独立控制的前栅极和后栅极的全耗尽SOI MOSFET的高效计算紧凑模型

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In this paper a computationally efficient surface-potential-based compact model for fully-depleted SOI MOSFETs with independently-controlled front- and back-gates is presented. A fully-depleted SOI MOSFET with a back-gate is essentially an independent double-gate device. To the best of our knowledge, existing surface-potential-based models for independent double-gate devices require numerical iteration to compute the surface potentials. This increases the model computational time and may cause convergence difficulties. In this work, a new approximation scheme is developed to compute the surface potentials and charge densities using explicit analytical equations. The approximation is shown to be computationally efficient and preserves important properties of fully-depleted SOI MOSFETs such as volume inversion. Drain current and charge expressions are derived without using the charge sheet approximation and agree well with TCAD simulations. Non-ideal effects are added to describe the I-V and C-V of a real device. Source-drain symmetry is preserved for both the current and the charge models. The full model is implemented in Veri!og-A and its convergence is demonstrated through transient simulation of a coupled ring oscillator circuit with 2020 transistors.
机译:本文提出了一种具有计算效率的基于表面电势的紧凑模型,该模型用于具有独立控制的前栅极和后栅极的全耗尽SOI MOSFET。具有背栅的全耗尽SOI MOSFET本质上是一个独立的双栅器件。据我们所知,现有的基于表面电势的独立双栅极器件模型需要进行数值迭代才能计算出表面电势。这增加了模型的计算时间,并可能导致收敛困难。在这项工作中,开发了一种新的近似方案,以使用显式解析方程计算表面电势和电荷密度。近似值显示出计算效率,并且保留了全耗尽SOI MOSFET的重要特性,例如体积反转。无需使用电荷表近似值即可得出漏极电流和电荷表达式,并且与TCAD仿真非常吻合。添加了非理想效果来描述真实设备的I-V和C-V。对于电流模型和电荷模型,源漏对称性得以保留。完整模型在Veri!og-A中实现,并且通过具有2020个晶体管的耦合环形振荡器电路的瞬态仿真证明了其收敛性。

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