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Measurements of charge carrier mobilities and drift velocity saturation in bulk silicon of <111> and <100> crystal orientation at high electric fields

机译:在高电场下测量<111>和<100>晶体取向的体硅中的载流子迁移率和漂移速度饱和度

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摘要

The mobility of electrons and holes in silicon depends on many parameters. Two of them are the electric field and the temperature. It has been observed previously that the mobility in the transition region between ohmic transport and saturation velocities is a function of the orientation of the crystal lattice. This paper presents a new set of parameters for the mobility as function of temperature and electric field for <111> and <100> crystal orientation. These parameters are derived from time of flight measurements of drifting charge carriers in planar p~+nn~+ diodes in the temperature range between -30 ℃ and 50 ℃ and electric fields of 2 × 10~3 V/cm to 2 × 10~4 V/cm.
机译:电子和硅中空穴的迁移率取决于许多参数。其中两个是电场和温度。先前已经观察到,在欧姆传输和饱和速度之间的过渡区域中的迁移率是晶格取向的函数。本文针对<111>和<100>晶体取向提出了一组随温度和电场变化的迁移率参数。这些参数来自于在-30℃至50℃温度范围内的平面p〜+ nn〜+二极管中漂移电荷载流子的飞行时间测量值以及2×10〜3 V / cm至2×10〜的电场4 V /厘米。

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  • 来源
    《Solid-State Electronics》 |2011年第1期|p.104-110|共7页
  • 作者单位

    Institute for Experimental Physics, University of Hamburg, Luruper Chaussee 149, 22761 Hamburg, Germany;

    Institute for Experimental Physics, University of Hamburg, Luruper Chaussee 149, 22761 Hamburg, Germany;

    Institute for Experimental Physics, University of Hamburg, Luruper Chaussee 149, 22761 Hamburg, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    mobility; silicon; electric field; anisotropy;

    机译:迁移率硅电场各向异性;
  • 入库时间 2022-08-18 01:34:43

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