Implantation angle periphery effects on non-alloyed Si-implanted ohmic contacts for AlGaN/GaN high electron mobility transistors

摘要

We report on the effect of implantation angle on contact resistance of non-alloyed ohmic contacts to selectively implanted source/drain regions in AlGaN/GaN high electron mobility transistor (HEMT) het-erostructures. Three different components of contact resistance are observed for such contacts: (ⅰ) contact resistance between the metal and the semiconductor, (ⅱ) resistance of the implanted region and (ⅲ) an additional resistance attributed to a transition region between implanted and non-implanted region. This third component varies strongly with implantation angle. The variation with implantation angle shows that the ratio of lateral implantation damage to penetration depth is critical for implantation of AlGaN/GaN HEMT source/drain contact regions. Our results also show that increasing the implantation angle in combination with reducing the implantation width can reduce contact resistance.