机译:通过选择性区域生长技术在Si衬底上实现高场效应迁移率常关型AlGaN / GaN混合MOS-HFET
Advanced Power Device Research Association, 2-4-3 Okano, Nishi-ku, Yokohama 220-0073, Japan;
Advanced Power Device Research Association, 2-4-3 Okano, Nishi-ku, Yokohama 220-0073, Japan;
Advanced Power Device Research Association, 2-4-3 Okano, Nishi-ku, Yokohama 220-0073, Japan;
Advanced Power Device Research Association, 2-4-3 Okano, Nishi-ku, Yokohama 220-0073, Japan;
Advanced Power Device Research Association, 2-4-3 Okano, Nishi-ku, Yokohama 220-0073, Japan;
Advanced Power Device Research Association, 2-4-3 Okano, Nishi-ku, Yokohama 220-0073, Japan;
normally-off; gallium nitride; heterojunction field-effect transistor (hfet); mos; selective area growth (sag) technique;
机译:具有高击穿电压的Si衬底上超过100 A的常关型AlGaN / GaN混合MOS-HFET
机译:常压AlGaN / GaN高电子迁移率在Si衬底上,具有选择性屏障再生在欧姆地区
机译:高性能常关型AlGaN / GaN MOSFET的选择性区域生长技术中的背景掺杂抑制
机译:具有Al
机译:常压高电子迁移率晶体管的设计,仿真和制造,具有温度稳定性研究
机译:用多指架构调制对高功率应用的自终止蚀刻技术常关P-GAN / ALGAN / GAN HEMT的研究
机译:在非平面(0001)衬底上尺寸和位置受控的GaN / AlGaN纳米线的选择性分子束外延生长及其生长机理
机译:m面alGaN / GaN和alInN / GaN异质结构的外延生长适用于常驻型GaN基板上的常关模式高功率场效应晶体管