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A formula for the central potential's maximum magnitude in arbitrarily doped symmetric double-gate MOSFETs

机译:任意掺杂的对称双栅MOSFET的中心电势最大幅度的公式

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We propose here a simple approximate, yet accurate, formula to easily calculate the maximum magnitude of the electric potential at the channel width's midpoint of symmetric Double Gate (DC) MOSFETs with any arbitrary body doping concentration. According to it this maximum magnitude depends only on the body's thickness and doping concentration, apart from its usual dependence on quasi-Fermi level splitting. The new formula allows to easily determine the critical body thickness value above which any arbitrarily doped symmetric DC MOSFET can be satisfactorily modeled using a conventional bulk MOSFET model. This critical value depends only on body doping concentration, The proposed approximate formula also constitutes a useful means to quickly calculate initial values in iterative numerical calculations of doped symmetric DG MOSFET models.
机译:我们在这里提出一个简单的近似但精确的公式,以轻松计算具有任意体掺杂浓度的对称双栅极(DC)MOSFET的沟道宽度中点处的最大电位。根据它,最大幅度仅取决于人体的厚度和掺杂浓度,除了通常依赖于准费米能级分裂。通过新公式,可以轻松确定关键的主体厚度值,在该临界值以上,可以使用常规体MOSFET模型对任何任意掺杂的对称DC MOSFET进行满意建模。该临界值仅取决于体掺杂浓度。建议的近似公式也构成了一种有用的方法,可以快速计算掺杂对称DG MOSFET模型的迭代数值计算中的初始值。

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