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The world's first high voltage GaN-on-Diamond power semiconductor devices

机译:全球首款高压GaN-on-Diamond功率半导体器件

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摘要

This paper presents the detailed fabrication method and extensive electrical characterisation results of the first-ever demonstrated high voltage GaN power semiconductor devices on CVD Diamond substrate. Fabricated circular GaN-on-Diamond HEMTs with gate-to-drain drift length of 17 mu m and source field plate length of 3 mu m show an off-state breakdown voltage of similar to 1100 V. Temperature characterisation of capacitance-voltage characteristics and on-state characteristics provides insight on the temperature dependence of key parameters such as threshold voltage, 2DEG sheet carrier concentration, specific on-state resistance, and drain saturation current in the fabricated devices. (C) 2016 Elsevier Ltd. All rights reserved.
机译:本文介绍了有史以来首次在CVD Diamond衬底上演示的高压GaN功率半导体器件的详细制造方法和广泛的电学表征结果。栅极到漏极漂移长度为17μm,源极场板长度为3μm的圆形GaN-on-Diamond HEMT的截止态击穿电压接近1100V。电容-电压特性和导通状态特性可洞悉关键参数对温度的依赖性,例如阈值电压,2DEG薄层载流子浓度,比导通状态电阻和制造设备中的漏极饱和电流。 (C)2016 Elsevier Ltd.保留所有权利。

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