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Steep subthreshold slope characteristics of body tied to gate NMOSFET in partially depleted SOI

机译:部分耗尽的SOI中与栅极NMOSFET相连的主体的陡峭亚阈值斜率特性

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摘要

A new body tied to gate (BTG) n-channel metal-oxide-semiconductor field-effect-transistor (NMOSFET) with a diode in partially depleted SOI (PD SOI) is proposed and investigated. We first compare the transfer and output characteristics between the regular and BTG NMOSFETs with grounded body and floating body. The steep subthreshold slope (<6 mV/dec) and low OFF current (similar to 0.01 pA/mu m) of the BTG NMOSFET with floating body are observed at V-D = 3. 3 V. Mechanisms of the floating body effect (FBE) and the diode are analyzed to explain the outstanding performance. The hysteresis characteristics of BTG NMOSFETs are also presented in comparison to regular ones. Finally, the steep subthreshold characteristics of the BTG NMOSFET with floating body at low drain voltage are studied for ultralow power application. (C) 2017 Elsevier Ltd. All rights reserved.
机译:提出并研究了一种利用二极管在部分耗尽型SOI(PD SOI)中与栅极(BTG)n沟道金属氧化物半导体场效应晶体管(NMOSFET)相连的新方法。我们首先比较具有接地体和浮体的常规和BTG NMOSFET之间的传输和输出特性。在VD = 3时,观察到具有浮体的BTG NMOSFET的陡峭的亚阈值斜率(<6 mV / dec)和低截止电流(大约0.01 pA /μm)。VB = 3V。浮体效应(FBE)的机理对二极管和二极管进行了分析,以解释其出色的性能。与常规晶体管相比,还给出了BTG NMOSFET的磁滞特性。最后,针对超低功率应用,研究了具有低漏电压浮体的BTG NMOSFET的陡峭亚阈值特性。 (C)2017 Elsevier Ltd.保留所有权利。

著录项

  • 来源
    《Solid-State Electronics》 |2017年第4期|15-19|共5页
  • 作者单位

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China|Shanghai Huahong Grace Semicond Mfg Corp, Shanghai 201203, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China;

    Shanghai Huahong Grace Semicond Mfg Corp, Shanghai 201203, Peoples R China;

    Shanghai Huahong Grace Semicond Mfg Corp, Shanghai 201203, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Diode; Floating body effect; Parasitic bipolar transistor; Partially depleted SOI; Subthreshold slope;

    机译:二极管;浮体效应;寄生双极晶体管;SOI部分耗尽;亚阈值斜率;

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