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A reversible bipolar WORM device based on AlOxNy thin film with Al nano phase embedded

机译:基于AlOxNy薄膜的可逆双极WORM器件,其中嵌入了Al纳米相

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摘要

An Al-rich AlOxNy thin film based reversible Write-Once-Read-Many-Times (WORM) memory device with MIS structure could transit from high resistance state (HRS, similar to 10(11) Omega) to low resistance state (LRS, similar to 10(5) Omega) by sweeping voltage up to similar to 20 V. The first switching could be recorded as writing process for WORM device which may relate to conductive path are formed through the thin film. The conductive path should be formed by both Al nano phase and oxygen vacancies. Among of them, Al nano phases are not easy to move, but oxygen vacancies could migrate under high E-field or at high temperature environment. Such conductive path is not sensitive to charging effect after it formed, but it could be broken by heating effect, which may relate to the migration of excess Al ions and oxygen vacancies at high temperature. After baking LRS (ON state) WORM device at 200 degrees C for 2 min, the conductivity will decrease to HRS which indicates conductive path is broken and device back to HRS (OFF state) again. This phenomenon could be recorded as recovery process. Both writing and recovery process related to migration of oxygen vacancies and could be repeated over 10 times in this study. It also indicates that there is no permanent breakdown occurred in MIS structured WORM device operation. We suggest that this conductive path only can be dissolved by a temperature sensitive electro-chemical action. This WORM device could maintain at LRS over 10(5) s with on-off ratio over 4 orders. (C) 2016 Elsevier Ltd. All rights reserved.
机译:具有MIS结构的基于Al的富含AlOxNy薄膜的可逆一次写入多次读取(WORM)存储设备可以从高阻态(HRS,类似于10(11)Omega)转变为低阻态(LRS,通过将电压扫描到接近20 V来类似于10(5)Omega。第一次开关可以记录为WORM器件的写入过程,该过程可能与通过薄膜形成的导电路径有关。导电路径应由铝纳米相和氧空位共同形成。其中,Al纳米相不易移动,但氧空位可能在高电场或高温环境下迁移。这种导电路径在形成后对充电效应不敏感,但可能被加热效应破坏,这可能与高温下过量的Al离子的迁移和氧空位有关。在200摄氏度下烘烤LRS(ON状态)WORM器件2分钟后,电导率将降低至HRS,这表明导电路径已断开,并且器件再次回到HRS(OFF状态)。此现象可以记录为恢复过程。写作和恢复过程都与氧空位的迁移有关,在本研究中可以重复10次以上。这也表明在MIS结构的WORM设备操作中没有发生永久性故障。我们建议该导电路径只能通过对温度敏感的电化学作用来溶解。该WORM设备可以在LRS上保持10(5)s以上的时间,并具有4个订单以上的开关比率。 (C)2016 Elsevier Ltd.保留所有权利。

著录项

  • 来源
    《Solid-State Electronics》 |2017年第3期|134-137|共4页
  • 作者

    Zhu W.; Li J.; Zhang L.; Hu X. C.;

  • 作者单位

    Changan Univ, Sch Elect & Control Engn, Xian, Peoples R China;

    Changan Univ, Sch Elect & Control Engn, Xian, Peoples R China;

    Changan Univ, Sch Elect & Control Engn, Xian, Peoples R China;

    Changan Univ, Sch Elect & Control Engn, Xian, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    WORM memory device; Al-rich AION thin film; Resistive switching;

    机译:WORM存储设备;富铝AION薄膜;电阻切换;
  • 入库时间 2022-08-18 01:33:15

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