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An insight to mobility parameters for AOSTFTs, when the effect of both, localized and free carriers, must be considered to describe the device behavior

机译:当必须考虑局部载流子和自由载流子的影响时,必须了解AOSTFT的迁移率参数,才能描述器件的行为

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摘要

The relation between the empirical mobility model parameters used for amorphous thin film transistors and physical device parameters is analyzed, when both localized and free carriers have to be considered to represent the device behavior. A simple procedure is presented to obtain the characteristic temperature and trap concentration of the DOS at the conduction band, using only the linear transfer characteristic at room temperature. An empirical analytical expression that represents analytically the dependence of the surface potential on the gate voltage is presented and validated. Using this expression, the procedure described to calculate the above mentioned parameters is completely analytical. The procedure presented is applied to experimental data of a-IGZO TFTs fabricated with two different technological process.
机译:当必须同时考虑局部载流子和自由载流子来表示器件行为时,将分析用于非晶薄膜晶体管的经验迁移率模型参数与物理器件参数之间的关系。提出了一种简单的程序,仅使用室温下的线性传递特性即可获得导带上DOS的特征温度和陷阱浓度。提出并验证了一个经验解析表达式,该解析表达式可以解析地表示表面电势对栅极电压的依赖性。使用该表达式,描述的计算上述参数的过程是完全解析的。本文提出的程序适用于采用两种不同工艺制造的a-IGZO TFT的实验数据。

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