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Optical properties and deep levels in annealed Si1-xMnx bulk materials

机译:Si1-xMnx块状退火材料的光学性质和深能级

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The optical proper-ties and the deep levels in bulk Si1-xMnx formed by using an implantation and annealing method were investigated. Transmission electron microscopy, X-ray diffraction, and Hall-effect measurements showed that the annealed bulk Si1-xMnx samples were p-type crystalline semiconductors. The photoluminescence spectra for the annealed bulk Si1-xMnx material showed luminescence peaks corresponding to excitons bound to neutral acceptors and related to dislocations due to the existence of Mn impurities. Deep-level transient spectroscopy results for the annealed bulk Si1-xMnx showed deep levels related to the interstitial and substitutial sites of the Mn+ ions. These results can help improve understanding of the optical properties and the deep levels in annealed bulk Si1-xMnx material. (c) 2006 Elsevier Ltd. All rights reserved.
机译:研究了通过注入和退火方法形成的块体Si1-xMnx的光学性质和深能级。透射电子显微镜,X射线衍射和霍尔效应测量表明,退火后的块体Si1-xMnx样品是p型晶体半导体。退火的块体Si 1-x Mn x材料的光致发光光谱显示出发光峰,该峰对应于与中性受体结合的激子,并且由于存在锰杂质而与位错有关。退火后的块体Si1-xMnx的深层瞬态光谱结果表明,深层的水平与Mn +离子的间隙和取代位有关。这些结果可以帮助增进对退火的块状Si1-xMnx材料的光学性能和深能级的理解。 (c)2006 Elsevier Ltd.保留所有权利。

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