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Comparative study of lower fullerenes doped with boron and nitrogen

机译:硼和氮掺杂的低级富勒烯的比较研究

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This work is aimed at comparing the relative stabilities of lower fullerenes C-n (40 <= n <= 50) doped with boron and nitrogen. Semi-empirical geometry optimizations and ab initio electronic structure calculations on pure and substituted fullerenes are presented. Nitrogen doping substantially decreases the formation enthalpy of all molecular cages when the dopant occupies pentagonal sites. Boron adopts a more planar geometry and is preferentially substituted in hexagonal sites, being less efficient in stabilizing the curved fullerene structures. The electronic structures of C-50 isomers substituted by nitrogen and boron are shown to form donor/acceptor pairs for use in molecular rectification. (c) 2006 Elsevier Ltd. All rights reserved.
机译:这项工作旨在比较掺杂硼和氮的低级富勒烯C-n(40 <= n <= 50)的相对稳定性。提出了半经验几何优化和纯和取代富勒烯从头算电子结构的计算。当掺杂剂占据五边形部位时,氮掺杂实质上降低了所有分子笼的形成焓。硼采用更平坦的几何形状,并且优先在六边形位置被取代,在稳定弯曲富勒烯结构方面效率较低。已显示被氮和硼取代的C-50异构体的电子结构形成了供分子/分子对使用的供体/受体对。 (c)2006 Elsevier Ltd.保留所有权利。

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