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Strong photoluminescence anisotropy in porous silicon layers prepared by polarized-light assisted anodization

机译:偏振光辅助阳极氧化制备的多孔硅层中的强光致发光各向异性

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摘要

Linearly-polarized infrared (1.06 mu m) laser light with intensities ranging from 5.3 to 97 mW/cm(2) has been used to obtain anisotropically luminescent porous silicon (PSi) layers by photoanodic etching in a hydrofluoric acid solution. Remarkably large photoluminescence (PL) anisotropy has been observed in samples prepared with the highest illumination intensity. These samples show very low degrees of linear polarization when the PL excitation light is polarized parallel to the polarization direction of the etching light. When the excitation light is polarized perpendicular to that, we obtain usual degrees of linear polarization of several percent. This result indicates that anisotropic Si nanostructures in PSi layers can be made isotropic with high orientation selectivity by the polarized-light assisted technique. A simple two-dimensional model is presented to explain the observed prominent anisotropy. (c) 2006 Elsevier Ltd. All rights reserved.
机译:强度在5.3至97 mW / cm(2)范围内的线偏振红外(1.06μm)激光已用于通过在氢氟酸溶液中进行光阳极蚀刻来获得各向异性发光的多孔硅(PSi)层。在以最高照度制备的样品中,观察到很大的光致发光(PL)各向异性。当PL激发光平行于蚀刻光的偏振方向偏振时,这些样品显示出非常低的线性偏振度。当激发光垂直于该偏振光偏振时,我们将获得通常百分之几的线性偏振度。该结果表明,通过偏振光辅助技术可以使PSi层中的各向异性Si纳米结构具有高取向选择性而各向同性。提出了一个简单的二维模型来解释观察到的突出各向异性。 (c)2006 Elsevier Ltd.保留所有权利。

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