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Microstructure and electrical properties of vanadium-doped zinc oxide-based non-ohmic resistors

机译:钒掺杂氧化锌基非欧姆电阻的微观结构和电性能

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The microstructure and non-ohmic properties of the ternary system ZVM were investigated in accordance with Mn_3O_4 content. For all samples, the microstructure of the ternary system ZnO-V_2O_5-Mn_3O_4 consisted of mainly ZnO grain and secondary phase Zn_3(VO_4)_2. The incorporation of Mn_3O_4 to the binary system ZnO-V_2O_5 was found to restrict the abnormal grain growth of ZnO. The breakdown voltage in the V-I characteristics increased from 17.5 to 463.5 V/mm with the increase in Mn_3O_4 content. The incorporation of Mn_3O_4 up to 0.5 mol% improved non-ohmic properties by increasing non-ohmic coefficient, whereas the further additions decreased it. The highest non-ohmic coefficient (22.2) was obtained from Mn_3O_4 content of 0.5 mol%. It was found that the highest barrier height at grain boundary was 2.66 eV for Mn_3O_4 content of 0.5 mol%.
机译:根据Mn_3O_4的含量研究了三元体系ZVM的微观结构和非欧姆特性。对于所有样品,三元体系ZnO-V_2O_5-Mn_3O_4的微观结构主要由ZnO晶粒和第二相Zn_3(VO_4)_2组成。发现将Mn_3O_4掺入二元体系ZnO-V_2O_5可以限制ZnO的异常晶粒生长。随着Mn_3O_4含量的增加,V-I特性的击穿电压从17.5 V / mm增加到463.5 V / mm。 Mn_3O_4的添加高达0.5 mol%通过增加非欧姆系数改善了非欧姆性能,而进一步的添加则降低了非欧姆系数。由0.5mol%的Mn_3O_4含量获得最高的非欧姆系数(22.2)。发现对于0.5mol%的Mn_3O_4含量,晶界处的最高势垒高度为2.66eV。

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