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Fabrication and characterization of GaN/amorphous Ga_2O_3 nanocables through thermal oxidation

机译:GaN /非晶Ga_2O_3纳米电缆的热氧化制备与表征

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In an effort to obtain one-dimensional core/shell nanostructures, thermal oxidation behavior of GaN nanowires in O_2 with N_2 ambients was investigated by x-ray diffraction, transmission electron microscopy, and x-ray photoelectron spectroscopy. Crystallinity and chemical bonding states of the oxidized surface in the GaN nanowires were strongly dependent on the oxidation temperature. Chemical oxidation reaction occurred upon increasing the temperature, accompanied by the formation of an amorphous Ga_2O_3 layer at the GaN nanowire surface at 900℃. The XPS analyses provided further evidence supporting the change in the chemical bonding states with increasing oxidation temperature.
机译:为了获得一维核/壳纳米结构,通过X射线衍射,透射电子显微镜和X射线光电子能谱研究了N_2环境下O_2中GaN纳米线的热氧化行为。 GaN纳米线中被氧化表面的结晶度和化学键合状态在很大程度上取决于氧化温度。温度升高时发生化学氧化反应,并在900℃时在GaN纳米线表面形成非晶Ga_2O_3层。 XPS分析提供了进一步的证据,证明了随着氧化温度的升高,化学键态的变化。

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