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Femtosecond laser-induced ZnSe nanowires on the surface of a ZnSe wafer in water

机译:飞秒激光诱导的水中ZnSe晶片表面的ZnSe纳米线

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摘要

We present a simple route for ZnSe nanowire growth in the ablation crater on a ZnSe crystal surface. The crystal wafer, which was horizontally dipped in pure water, was irradiated by femtosecond laser pulses. No furnace, vacuum chamber or any metal catalyst were used in this experiment. The size of the nanowires is about 1-3 μm long and 50-150 nm in diameter. The growth rate is 1-3 μm/s, which is much higher than that achieved with molecular-beam epitaxy and chemical vapor deposition methods. Our discovery reveals a rapid and simple way to grow nanowires on designed micro-patterns, which may have potential applications in microscopic optoelectronics.
机译:我们提出了在ZnSe晶体表面的烧蚀坑中ZnSe纳米线生长的简单途径。飞秒激光脉冲照射水平浸在纯水中的晶体晶片。在该实验中没有使用炉子,真空室或任何金属催化剂。纳米线的尺寸为约1-3μm长,直径为50-150nm。生长速度为1-3μm/ s,远高于分子束外延和化学气相沉积方法。我们的发现揭示了一种快速而简单的方法来在设计的微图案上生长纳米线,这可能在微观光电学中具有潜在的应用。

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