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Tetrahedrite (Cu_(12)Sb_4S_(13)) thin films for photovoltaic and thermoelectric applications

机译:用于光伏和热电应用的四面体(Cu_(12)Sb_4S_(13))薄膜

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摘要

In this paper we have demonstrated the growth of Cu12Sb4S13 thin film through e-beam evaporation from a single source. The source material was pre-synthesised via ball mill method starting from a stoichiometric mixture of elements (Cu, Sb and S) taken in the atomic ratio of 12:4:13. The films were deposited at different beam currents viz. 40, 50 and 60 mA. The bulk material and thin films were studied using X-ray diffraction (XRD) and Raman spectroscopy to evaluate phase formation. The films grown at beam current values of 40 mA showed the presence of Cu12Sb4S13 phase along with Cu3SbS4 and CuS secondary phases. The films grown at 50 mA and 60 mA are showing Cu3SbS4 phase as main phase. These results are in agreement with the Raman studies. The composition of as grown films was analysed using Rutherford backscattered spectrometry (RBS) and proton induced X-ray emission (PIXE) measurements. The Cu content in the films is decreasing with increase in the beam current, whereas the Sb and S content shows increment. The optical absorption measurement was used to determine the optical band gap. The films show a direct band gap value of similar to 1.8 eV with an optical absorption coefficient of similar to 10(5) cm(-1). Temperature dependant Seebeck coefficient and electrical resistivity values were measured for the thin films and the power factor values were calculated. The positive Seebeck coefficient values obtained indicate p-type semiconducting nature of the films. The maximum power factor of 2.30 mu W/cm-K-2 at 495 K was obtained for films grown at 40 mA e-beam current. The electrical and optical properties are significantly influenced by the presence of secondary phases and compositional deviation.
机译:在本文中,我们证明了通过单一来源的电子束蒸发可以生长Cu12Sb4S13薄膜。通过球磨法从以原子比为12:4:13的元素(Cu,Sb和S)的化学计量混合物开始预合成原料。膜以不同的束流电流沉积。 40、50和60 mA。使用X射线衍射(XRD)和拉曼光谱研究了块状材料和薄膜,以评估相形成。在束电流值为40 mA的条件下生长的薄膜显示出Cu12Sb4S13相以及Cu3SbS4和CuS第二相的存在。在50 mA和60 mA下生长的薄膜显示出Cu3SbS4相为主要相。这些结果与拉曼研究一致。使用Rutherford背散射光谱(RBS)和质子诱导的X射线发射(PIXE)测量分析成膜薄膜的组成。膜中的Cu含量随着束电流的增加而降低,而Sb和S含量显示出增加。使用光吸收测量来确定光学带隙。薄膜显示的直接带隙值接近1.8 eV,光吸收系数接近10(5)cm(-1)。测量薄膜的温度相关塞贝克系数和电阻率值,并计算功率因数值。获得的正塞贝克系数值表示薄膜的p型半导体性质。对于以40 mA电子束电流生长的薄膜,在495 K下获得的最大功率因数为2.30μW / cm-K-2。次级相的存在和成分偏差会严重影响电学和光学性能。

著录项

  • 来源
    《Solar Energy》 |2018年第11期|422-430|共9页
  • 作者单位

    SRM Inst Sci & Technol, Dept Phys & Nanotechnol, Res Inst, Kattankulathur 603203, India;

    Natl Univ Singapore, Ctr Ion Beam Applicat, Dept Phys, Singapore, Singapore;

    Natl Univ Singapore, Ctr Ion Beam Applicat, Dept Phys, Singapore, Singapore;

    Indian Inst Sci, Dept Phys, Thermoelect Mat & Device Lab, Bangalore 560012, Karnataka, India;

    SRM Inst Sci & Technol, Dept Phys & Nanotechnol, Res Inst, Kattankulathur 603203, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    EBPVD; Tetrahedrite; Transport properties; Optical absorption;

    机译:EBPVD;四面体;传输性能;光学吸收;
  • 入库时间 2022-08-18 04:06:42

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