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Specific features of quasineutral carrier transport modes in semiconductors and semiconductor structures

机译:半导体和半导体结构中准中性载流子传输模式的特定特征

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摘要

It has been demonstrated that the field dependence of the electron and hole mobility strongly affects the carrier distribution in semiconductor structures under quasineutral conditions. Taking into account this phenomenon, a new equation for quasineutral carrier transport in semiconductors and semiconductor structures has been suggested. The concept of the critical current density j_(cr) has been introduced and validated. At j j_(cr), the suggested equation transforms to the well-known 'classical' equation of quasineutral transport. By contrast, at j > j_(cr), novel solutions become apparent from the suggested equation. The performed analysis gives insight into what happens in regions in which the quasineutral drift and DSQD (diffusion stimulated by quasineutral drift) modes predominate. Analytical expressions have been derived for the dependences of the voltage drops across the quasineutral drift and DQSD regions on current. It has been shown that, at high current densities, the voltage drop across the DSQD region tends to decrease as the current density increases. The results obtained enable a qualitative interpretation of the negative differential conductivity region in the current-voltage characteristic of forward-biased semiconductor structures, which arises at high current densities.
机译:已经证明,在准中性条件下,电子和空穴迁移率的场依赖性强烈影响半导体结构中的载流子分布。考虑到该现象,提出了用于半导体和半导体结构中的准中性载流子传输的新方程。临界电流密度j_(cr)的概念已被引入和验证。在j j_(cr)处,建议的方程式转换为众所周知的准中性传输的“经典”方程式。相比之下,在j> j_(cr)处,从所提出的方程式中可以得出新颖的解决方案。进行的分析可以洞悉在准中性漂移和DSQD(准中性漂移引起的扩散)模式占主导的区域中发生了什么。已经获得了关于准中性漂移和DQSD区域上的电压降的相关性的解析表达式。已经表明,在高电流密度下,随着电流密度的增加,DSQD区域上的电压降趋于减小。获得的结果能够定性地解释在高电流密度下出现的正向偏置半导体结构的电流-电压特性中的负差分电导率区域。

著录项

  • 来源
    《Semiconductor science and technology》 |2009年第7期|30-37|共8页
  • 作者单位

    All-Russia Electrotechnical Institute, Krasnokazarmennaya 12, 111250 Moscow, Russia;

    All-Russia Electrotechnical Institute, Krasnokazarmennaya 12, 111250 Moscow, Russia;

    All-Russia Electrotechnical Institute, Krasnokazarmennaya 12, 111250 Moscow, Russia;

    The Ioffe Physico-Technical Institute, Politekhnicheskaya 26, 194021 St. Petersburg, Russia;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 01:32:07

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