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Room-temperature continuous-wave operation of the In(Ga)As/GaAs quantum-dot VCSELs for the 1.3 μm optical-fibre communication

机译:用于1.3μm光纤通信的In(Ga)As / GaAs量子点VCSEL的室温连续波操作

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摘要

Efficient room-temperature (RT) continuous-wave (CW) lasing operation of the 1.3 μm MBE (molecular-beam epitaxy) In(Ga)As/GaAs quantum-dot (QD) top-emitting oxide-confined vertical-cavity surface-emitting diode lasers (VCSELs) for the second-generation optical-fibre communication has been achieved. In their design, a concept of a QD inside a quantum well (QW) has been utilized. The proposed In(Ga)As/GaAs QD active region is composed of five groups of three 8 nm In_(0.15)Ga_(0.85) As QWs, each containing one InAs QD sheet layer. In each group located close to successive anti-node positions of the optical standing wave within the 3λ. cavity, QWs are separated by 32 nm GaAs barriers. Besides, at both active-region edges, additional single InGaAs QWs are located containing single QD layers. For the 10 μm diameter QD VCSELs, the RT CW threshold current of only 6.2 mA (7.9 kA cm~(-2)), differential efficiency of 0.11 W A~(-1) and the maximal output power of 0.85 mW have been recorded. The experimental characteristics are in excellent agreement with theoretical ones obtained using the optical-electrical-thermal-recombination self-consistent computer model. According to this, for the 10 μm devices, the fundamental linearly polarized LP_(01) mode remains the dominating one up to the current of 9.1 mA. The lowest RT CW lasing threshold below 5 mA is expected for 6 μm devices.
机译:1.3μmMBE(分子束外延)In(Ga)As / GaAs量子点(QD)顶部​​发射氧化物限制的垂直腔表面的高效室温(RT)连续激光发射已经实现了用于第二代光纤通信的发光二极管激光器(VCSEL)。在他们的设计中,已经利用了量子阱(QW)内部的QD概念。拟议的In(Ga)As / GaAs QD有源区由三组8 nm In_(0.15)Ga_(0.85)As QW组成的五组组成,每组包含一个InAs QD薄层。在每个组中,它们位于3λ内光驻波的连续波腹位置附近。腔内,QW被32 nm GaAs势垒隔开。此外,在两个有源区边缘,还放置了包含单个QD层的其他单个InGaAs QW。对于直径为10μm的QD VCSEL,RT CW阈值电流仅为6.2 mA(7.9 kA cm〜(-2)),差分效率为0.11 W A〜(-1),最大输出功率为0.85 mW。实验特性与使用光电热重组自洽计算机模型获得的理论特性非常吻合。据此,对于10μm器件,基本线性极化LP_(01)模式在电流高达9.1 mA的情况下仍保持主导地位。对于6μm器件,预计最低的RT CW激射阈值低于5 mA。

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  • 来源
    《Semiconductor science and technology》 |2009年第5期|26-30|共5页
  • 作者单位

    Division of Microelectronics, School of Electrical and Electronic Engineering, Nanyang Technological University, Block 52, Nanyang Avenue, Singapore 639798, Singapore;

    Division of Microelectronics, School of Electrical and Electronic Engineering, Nanyang Technological University, Block 52, Nanyang Avenue, Singapore 639798, Singapore;

    Division of Microelectronics, School of Electrical and Electronic Engineering, Nanyang Technological University, Block 52, Nanyang Avenue, Singapore 639798, Singapore;

    Division of Microelectronics, School of Electrical and Electronic Engineering, Nanyang Technological University, Block 52, Nanyang Avenue, Singapore 639798, Singapore;

    Division of Microelectronics, School of Electrical and Electronic Engineering, Nanyang Technological University, Block 52, Nanyang Avenue, Singapore 639798, Singapore;

    Laboratory of Computer Physics, Institute of Physics, Technical University of Lodz, ul. Wolczanska 219, 90-924 Lodz, Poland;

    Laboratory of Computer Physics, Institute of Physics, Technical University of Lodz, ul. Wolczanska 219, 90-924 Lodz, Poland;

    Laboratory of Computer Physics, Institute of Physics, Technical University of Lodz, ul. Wolczanska 219, 90-924 Lodz, Poland;

    Laboratory of Computer Physics, Institute of Physics, Technical University of Lodz, ul. Wolczanska 219, 90-924 Lodz, Poland;

    Laboratory of Computer Physics, Institute of Physics, Technical University of Lodz, ul. Wolczanska 219, 90-924 Lodz, Poland;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 01:31:56

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