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Trends In The Electronic Structure Of Dilute Nitride Alloys

机译:稀氮化物合金的电子结构趋势

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The band-anticrossing (BAC) model has been widely applied to analyse the electronic structure of dilute nitride III-V-N alloys such as GaN_xAs_(1-x) The BAC model describes the strong band gap bowing observed at low N composition in GaN_x As_(1-x)in terms of an interaction between the GaAs host matrix conduction band edge and a higher lying band of localized N resonant states. In practice, replacing As by N introduces a range of N-related defect levels, associated with isolated N atoms, N-N pairs and larger clusters of N atoms. We show that the effect of such defect levels on the alloy conduction band structure is strongly dependent on the relative energy of the defect levels and the host conduction band edge. We first consider GaN_xAs_(1-x), where we show that the unexpectedly large electron effective mass and gyromagnetic ratio, and their non-monotonic variation with x, are due to hybridization between the conduction band edge and specific nitrogen states close to the band edge. The N-related defect levels lie below the conduction band edge in GaN_xP_(1-x). We must therefore explicitly treat the interaction between the higher lying GaP host Γ conduction band minimum and defect states associated with a random distribution of N atoms in order to obtain a good description of the lowest conduction states in disordered GaPN alloys. Turning to other alloys, N-related defect levels should generally lie well above the conduction band minimum in InNSb, with the band dispersion of InNSb then well described by a two-level BAC model. Both InP and InAs are intermediate between InSb and GaAs. By contrast, we calculate that N-related defect levels lie close to the conduction band minimum in GaNSb, and will therefore strongly perturb the lowest conduction states in this alloy. Overall, we conclude that the BAC model provides a good qualitative explanation of the electronic properties of dilute nitride alloys, but that it is in many cases necessary to include the details of the distribution of N-related defect levels to obtain a quantitative understanding of the conduction band structure in dilute nitride alloys.
机译:带反交叉(BAC)模型已被广泛用于分析GaN_xAs_(1-x)等稀氮化物III-VN合金的电子结构.BAC模型描述了在GaN_x As_(在GaAs基质矩阵导带边缘与局部N共振态的较高说谎带之间的相互作用方面,存在1-x)。实际上,用N代替As会引入一系列与N相关的缺陷水平,这些缺陷水平与孤立的N原子,N-N对和更大的N原子簇相关。我们表明,这种缺陷水平对合金导带结构的影响在很大程度上取决于缺陷能级和主体导带边缘的相对能量。我们首先考虑GaN_xAs_(1-x),其中我们表明出乎意料的大电子有效质量和旋磁比以及它们与x的非单调变化是由于导带边缘和靠近该带的特定氮态之间的杂化所致边缘。 N相关缺陷水平在GaN_xP_(1-x)中的导带边缘以下。因此,我们必须明确地对待较高的GaP主体Γ导带最小值和与N原子的随机分布相关的缺陷状态之间的相互作用,以便获得对无序GaPN合金中最低导电状态的良好描述。至于其他合金,N相关缺陷水平通常应远高于InNSb的导带最小值,然后用两级BAC模型很好地描述InNSb的能带色散。 InP和InAs都位于InSb和GaAs之间。相比之下,我们计算出与N相关的缺陷能级接近GaNSb中的最小导带,因此会强烈干扰该合金的最低导通态。总体而言,我们得出的结论是,BAC模型可以很好地定性解释稀氮化物合金的电子性能,但是在许多情况下,有必要包括N相关缺陷水平分布的详细信息,以便对合金的定量理解。稀氮化物合金的导带结构。

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