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Size determination of InAs quantum dots using magneto-tunnelling experiments

机译:利用磁隧道实验确定InAs量子点的尺寸

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Tunnelling experiments through GaAs-AlAs-GaAs structures with InAs embedded in the AlAs barrier show steps in the current-voltage characteristics which we assign to single-electron tunnelling through self-assembled InAs quantum dots between two three-dimensional electrodes. From the magnetic field dependence of the onset of the current steps, we determine the lateral extension of the electronic wave function in the dot to 4 nm. corresponding to a dot of 14 nm in diameter. Replica of steps at higher voltages are attributed to tunnelling through charged dots. A similar structural dot size is measured independently by transmission electron microscopy on the same wafer and by atomic force microscopy on control samples with InAs dots on a GaAs or an AlAs surface, respectively.
机译:通过嵌入在AlAs势垒中的InAs的GaAs-AlAs-GaAs结构进行的隧穿实验显示了电流-电压特性中的步骤,我们将其指定为通过两个三维电极之间的自组装InAs量子点进行单电子隧穿。从电流阶跃开始时的磁场依赖性,我们确定点中电子波函数的横向扩展到4 nm。对应于直径为14 nm的点。较高电压下的阶跃复制归因于通过带电点的隧穿。通过在同一晶片上的透射电子显微镜和在GaAs或AlAs表面分别具有InAs点的对照样品上的原子力显微镜分别测量相似的结构点大小。

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