首页> 外文期刊>Semiconductor Science and Technology >Tin oxide growth in nanoporous silicon: an approach to an efficient solid state electrode
【24h】

Tin oxide growth in nanoporous silicon: an approach to an efficient solid state electrode

机译:纳米多孔硅中氧化锡的生长:一种有效的固态电极的方法

获取原文
获取原文并翻译 | 示例
       

摘要

In this preliminary work, we show the ability of the Sol-Gel technique to introduce a solid phase into the nanopores of porous silicon. From RBS-C analysis, a complete incorporation of both tin and oxygen atoms over most of the porous layer thickness has been evidenced. TEM observations revealed the presence of small crystallites of cassiterite embedded in the porous layer. Providing that the silicon porosity does not exceed 70%, this solid phase does not degrade the skeleton of porous silicon and does not inhibit photoluminescence.
机译:在这项初步工作中,我们展示了Sol-Gel技术将固相引入多孔硅纳米孔中的能力。根据RBS-C分析,已经证明在大多数多孔层厚度上锡和氧原子都被完全结合。 TEM观察表明,在多孔层中嵌入了小的锡石微晶。只要硅的孔隙率不超过70%,该固相就不会降解多孔硅的骨架并且不会抑制光致发光。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号