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Photoelectric properties of higher manganese silicide (HMS)-Si (Mn)-M structures

机译:高级硅化锰(HMS)-Si(Mn)-M结构的光电性能

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Photoelectric properties of (HMS)-Si(Mn)-M structures, where HMS is higher manganese silicide formed in diffusion doping of silicon with manganese and M is metal contact, have been studied in a wide range of temperatures and light wavelengths. After illumination of these structures with hν = 1.12 eV light at T = 77 K is terminated, the photocurrent decays back to the dark current in a complicated manner, following a curve with two regions. The duration of decay is about several seconds and more than l05 s in the first and second regions, respectively. Deep infrared (IR) and temperature quenching of photoconductivity in these structures have been studied. Under illumination with h ν≥1.12 eV light and at low temperatures these structures can be considered HMS--i--p--M structures, with the i-region playing essential role in the generation of space-charge-limited currents (SCLC). Breakdown of the SCLC mode in these structures by ionization of manganese levels with extra IR light (hν= 0.42 - 0.6 eV) or by heating results in a sharp decrease of the photocurrent flowing through the structures (especially in the case of temperature quenching in a narrow temperature range ΔT = 15-20 K).
机译:(HMS)-Si(Mn)-M结构的光电性能已在很宽的温度和光波长范围内进行了研究,其中HMS是在硅与锰的扩散掺杂中形成的高锰硅化物,而M是金属接触。用hν= 1.12 eV照亮这些结构后,在T = 77 K处的光终止后,光电流按照复杂的方式衰减到暗电流,遵循具有两个区域的曲线。在第一区域和第二区域中,衰减的持续时间分别约为几秒钟,并且大于105s。已经研究了这些结构中的深红外(IR)和光电导的温度猝灭。在hν≥1.12eV光的照射下和低温下,这些结构可以被认为是HMS--i--p--M结构,其中i区域在空间电荷限制电流的产生中起着重要作用(SCLC )。通过用额外的红外光(hν= 0.42-0.6 eV)对锰水平进行电离或通过加热来破坏这些结构中的SCLC模式,会导致流过结构的光电流急剧下降(尤其是在温度淬火的情况下)。温度范围(ΔT= 15-20 K)。

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