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Photoelectric properties of sandwich Au/Bi_4Ti_3O_12/Si/Al heterostructures

机译:夹心Au / Bi_4Ti_3O_12 / Si / Al异质结构的光电性能

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Photoelectric properties of Au/Bi_4Ti_3O_12/Si/Al heterostructures were investigated in continuous and modulated light in the 250-1100 nm wavelength range. Four bands, centred on 400 nm (3.1 eV), 500 nm (2.48 eV), 865 nm (1.43 eV) and 1025 nm (1.2 eV), can be observed in the normalized spectral distributions of photoconducting and photovoltaic signals. The relative amplitudes of these peaks depend on the annealing temperature, ferroelectric polarization and illumination conditions. The 1025 nm (1.2 eV) and 400 nm (3.1 eV) bands were assigned to the intrinsic carrier generation in Si and Bi_4Ti_3O_12, respectively. The 865 nm (1.43 eV) band is due to the charge carrier excitation from some interface states acting as trapping centres. The 500 nm (2.48 eV) band was attributed to the intrinsic excitation in a third phase, probably a silicate, which is developing at the Bi_4Ti_3O_12-Si interface during the air annealing. The frequency dependence of the ac photovoltaic signal is wavelength dependent, suggesting different recombination mechanisms in the two basic materials. To explain the experimental results a possible band structure for the interface is proposed. This band structure considers the presence of spontaneous polarization in the ferroelectric film and the existence of some trapping states at the Bi_4Ti_3O_12-Si interface.
机译:研究了Au / Bi_4Ti_3O_12 / Si / Al异质结构在250-1100 nm波长范围内的连续光和调制光下的光电性能。在光电导和光伏信号的归一化光谱分布中,可以观察到四个以400 nm(3.1 eV),500 nm(2.48 eV),865 nm(1.43 eV)和1025 nm(1.2 eV)为中心的波段。这些峰的相对幅度取决于退火温度,铁电极化和照明条件。 1025 nm(1.2 eV)和400 nm(3.1 eV)波段分别分配给Si和Bi_4Ti_3O_12中的本征载流子产生。 865 nm(1.43 eV)的带是由于某些界面态作为俘获中心而引起的载流子激发。 500 nm(2.48 eV)的谱带归因于第三相(可能是硅酸盐)的固有激发,它在空气退火过程中在Bi_4Ti_3O_12-Si界面处形成。交流光伏信号的频率依赖性与波长有关,这表明两种基本材料的复合机制不同。为了解释实验结果,提出了一种可能的界面带结构。该能带结构考虑了铁电薄膜中的自发极化以及在Bi_4Ti_3O_12-Si界面处存在一些俘获态。

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