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Control and passivation of V_se defect levels in H_2Se-selenized CuInSe_2 thin films

机译:H_2硒化CuInSe_2薄膜中V_se缺陷水平的控制和钝化

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In this study, we investigated the dominating intrinsic defect levels in CuInSe_2 by means of temperature- and excitation-dependent steady-state photoluminescence (PL). The polycrystalline thin films were prepared by rapid thermal treatment of metallic alloys in H_2Se-Ar. Attention was mainly focused on the influence of post-growth treatments (in Ar-H_2 and O_2) on the defect structure of these films. The PL spectra of slightly In-rich as-grown films were dominated by a donor-acceptor pair transition at 0.92 eV The defect levels are ascribed to V_cu and V_se and their activation energies have been determined to be 45 and 95 meV respectively. Post-growth treatment in Ar-H_2 resulted in a shift of these peaks to higher energies and a significant increase in the intensity. In contrast, annealing in O_2 resulted in a shift of the peak to lower energies and to a dramatic reduction in intensity, compared with the as-grown samples. These effects were also found to be reversible. The change of the PL spectra on oxygen and hydrogen annealing is explained by the change of the density of Vs. defects. This is explained by a model in which oxygen can occupy a V_se site owing to coordinatively unsaturated In at the grain boundaries. The V_se concentration and therefore the device quality of these CuInSe_2 thin films can thus be controlled either by a post-growth annealing step or during the growth process itself.
机译:在这项研究中,我们通过依赖温度和激发的稳态光致发光(PL)研究了CuInSe_2中主要的固有缺陷水平。通过在H_2Se-Ar中对金属合金进行快速热处理来制备多晶薄膜。注意力主要集中在生长后处理(在Ar-H_2和O_2中)对这些膜的缺陷结构的影响。少量富In的成膜薄膜的PL光谱以0.92 eV的供体-受体对跃迁为主。缺陷水平归因于V_cu和V_se,其活化能分别确定为45和95 meV。 Ar-H_2中的生长后处理导致这些峰移向更高的能量,并且强度显着增加。相反,与生长的样品相比,在O_2中退火导致峰移动到较低的能量并导致强度急剧降低。还发现这些影响是可逆的。氧气和氢气退火过程中PL光谱的变化可以通过Vs密度的变化来解释。缺陷。这可以通过一个模型来解释,在该模型中,由于晶界处的不饱和In配位,氧可以占据V_se位点。因此,这些CuInSe_2薄膜的V_se浓度以及由此的器件质量可以通过生长后退火步骤或在生长过程本身中进行控制。

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