Maskmakers Struggle to Find the ROI on EUV Masks

摘要

In a sea of EUV lithography investments, the mask infrastructure has been woefully underfunded even as the EUV mask infrastructure has moved to the top of the critical list for EUVL readiness.rnAlthough source power remains a critical challenge for getting EUV lithography to high-volume production, source suppliers have been funding development in this area. Mask inspection, however, has not seen a similar commitment, and questions still remain about how the desperately needed infrastructure will be funded.