KHOW~® SYSTEM: Functional Water for Wet Cleaning Process

摘要

Kurita has developed various types of functional water production systems prepared by dissolving specific gases in ultrapure water (UPW), which can reduce the amount of chemicals used in cleaning process and UPW used in semiconductor/FPD manufacturing process. Three kinds of functional water system that we've developed are hydrogenated UPW (H_2-UPW) with megasonic irradiation which is effective for particle removal, ozonized UPW (O_3-UPW) which is effective for removing organic contaminants and metallic impurities, and carbonated UPW (CO_2-UPW) which is effective for preventing static electricity. Followings are benefits from the functional water application for wet cleaning process, and both reduction of operating cost and environmental impact can be achieved. a) Reduction of chemicals used in cleaning process b) Diminishment of UPW for rinsing process after chemical cleaning. c) Decrease the load of wastewater in both of quantity and quality d) Promoting wastewater reclamation.