Patent Issued for Rapid Thermal Processing Chamber with Micro-Positioning System

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Patent Issued for Rapid Thermal Processing Chamber with Micro-Positioning System

机译：具有微定位系统的快速热处理腔室已获得专利

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2012 DEC 3 (VerticalNews) -- By a News Reporter-Staff News Editor at Robotics & Machine Learning --nAccording to news reporting originating from Alexandria, Virginia, by VerticalNews journalists, a patent bynthe inventors Sorabji, Khurshed (San Jose, CA); Ranish, Joseph M. (San Jose, CA); Aderhold, Wolfgangn(Cupertino, CA); Hunter, Aaron M. (Santa Cruz, CA); Koelmel, Blake R. (Mountain View, CA); Lerner,nAlexander N. (San Jose, CA); Merry, Nir (Mountain View, CA), filed on November 4, 2009, was clearednand issued on November 20, 2012.

机译：2012年12月3日（VerticalNews）-机器人与机器学习新闻记者-Staff新闻编辑--n据VerticalNews记者发自弗吉尼亚州亚历山大市的新闻报道，发明人是发明人Sorabji，Khurshed的专利（加利福尼亚州圣何塞） ; Ranish，Joseph M.（加利福尼亚州圣何塞）；沃尔夫冈·阿德霍尔德（加利福尼亚州库珀蒂诺）;亨特（Aaron M。）（加利福尼亚州圣克鲁斯）；布莱克河（Blake R.）亚历山大·莱纳（Lerner，nAlexander N。）（加利福尼亚州圣何塞）；于2009年11月4日提交的Nir快活（Mir，Nir）于2012年11月20日被清除并发行。

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《Robotics and Machine Learning》 |2012年第49期|1-5|共5页
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Robotics, Machine Learning, Emerging Technologies, Applied Materials Inc..;

机译：机器人技术;机器学习;新兴技术;应用材料公司;

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1. Agency Reviews Patent Application Approval Request for "Rapid Thermal Processing Chamber with Micro-Positioning System" [J] . Robotics and Machine Learning . 2013,第10期

机译：机构审查“具有微定位系统的快速热处理室”的专利申请批准请求
2. Steady-state thermal uniformity and gas flow patterns in a rapid thermal processing chamber [J] . Campbell S.A., Ahn K.-H. IEEE Transactions on Semiconductor Manufacturing . 1991,第1期

机译：快速热处理室中的稳态热均匀性和气流模式
3. Patent Issued for Image Processing Program, Image Processing Apparatus, Image Processing Method and Image Processing System [J] . Journal of Engineering . 2013,第12期

机译：图像处理程序，图像处理设备，图像处理方法和图像处理系统已获专利
4. Optimization of Chamber Design and Rapid Thermal Processing Regimes for SiC Substrates by Temperature and Thermal Stress Distribution [C] . O.A. Agueev, A.M. Svetlichnyi, A.G. Klovo, 4th European Conference on Silicon Carbide and Related Materials (ECSCRM 2002); Sep 2-5, 2002; Linkoeping, Sweden . 2002

机译：通过温度和热应力分布优化SiC衬底的腔室设计和快速热处理方式
5. Processing and characterization of high performance gate dielectric materials by rapid photothermal process based atomic layer deposition (ALD) system. [D] . Fakhruddin, Mohammed. 2003

机译：基于快速光热过程的原子层沉积（ALD）系统对高性能栅极介电材料进行处理和表征。
6. Pre-eruptive magmatic processes re-timed using a non-isothermal approach to magma chamber dynamics [O] . Chiara Maria Petrone, Giuseppe Bugatti, Eleonora Braschi, -1

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8. Influence of wavelength-dependent radiation in simulation of lamp-heated rapid thermal processing systems [R] . Ting, A. 1994

机译：波长相关辐射对灯加热快速热处理系统仿真的影响

Patent Issued for Rapid Thermal Processing Chamber with Micro-Positioning System

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