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A FABRICATION PROCESS DEVIATION DETERMINATION METHOD, CALIBRATION METHOD, INSPECTION TOOL, FABRICATION SYSTEM AND A SAMPLE

机译:制造过程偏差确定方法,校准方法,检查工具,制造系统和样品

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摘要

Considering the above, it is an object of the invention to provide an inspection tool and corresponding method allowing an improved determination of fabrication process deviations According to an embodiment of the invention, there is provided a method for determining deviations in a fabrication process, comprising the following steps:a.providing a sample with a layer having a periodic structure fabricated using the fabrication process and intended to cause a corresponding part of the layer to be fully reflective for light having a wavelength in a wavelength range and having an angle of incidence in an angle range:b.illuminating the sample with light having a wavelength in the wavelength range and an angle of incidence in the angle range;c.detecting light reflected and/or scattered from the layer of the sample; and d.determining deviations in the fabrication process from the detected light. According to another embodiment of the invention, there is provided a method for calibrating a fabrication process, comprising the following steps:a.carrying out a method according to the invention to determine deviations in a fabrication process; and b.generating a correction signal for adjusting a fabrication process parameter based on the determined deviations in the fabrication process. According to a further embodiment of the invention, there is provided an inspection tool comprising:1.a sample holder for holding a sample;2.an illumination system for illuminating a sample in the sample holder 3.a detection system for detecting light reflected or scattered from a sample in the sample holder: and 4.a processing unit configured to determine deviations in a fabrication process used to fabricate a sample with a layer having a periodic structure intended to cause a corresponding part of the layer to be fully reflective for light having a wavelength in a wavelength range and having an angle of incidence in an angle range from an output of the detection system,wherein the illumination system is configured to emit light having a wavelength in the wavelength range and having an angle of incidence in the angle range.According to yet another embodiment of the invention, there is provided a fabrication system comprising a lithographic apparatus for carrying out at least a part of a fabrication process, and an inspection tool according to the invention.According to another embodiment of the invention, there is provided a sample with a layer having a periodic structure intended to cause a corresponding part of the layer to be fully reflective for light having a wavelength in a wavelength range and having an angle of incidence in an angle range, wherein the sample is suitable to be used in a method according to the invention or an inspection tool according to the invention.According to a further embodiment of the invention, there is provided a method for determining deviations in a fabrication process, comprising the following steps:a. providing a sample with a layer having a periodic structure fabricated using the fabrication process and intended to cause a corresponding part of the layer to be fully reflective for light having a wavelength in a wavelength range and having an angle of incidence in an angle range;b. illuminating the sample with light having a wavelength in the wavelength range and an angle of incidence in the angle range;c. detecting light transmitted through the sample; and d. determining deviations in the fabrication process from the detected light.According to yet another embodiment of the invention, there is provided a method for calibrating a fabrication process, comprising the following steps:a. providing a sample with a layer having a periodic structure fabricated using the fabrication process and intended to cause a corresponding part of the layer to be fully reflective for light having a wavelength in a wavelength range and having an angle of incidence in an angle range;b. illuminating the sample with light having a wavelength in the wavelength range and an angle of incidence in the angle range;c. detecting light transmitted through the sample;d. determining deviations in the fabrication process from the detected light; and e. generating a correction signal for adjusting a fabrication process parameter based on the determined deviations in the fabrication process.According to another embodiment of the invention, there is provided an inspection tool comprising:1.a sample holder for holding a sample;2.an illumination system for illuminating a sample in the sample holder;3.a detection system for detecting light transmitted through a sample in the sample holder; and 4.a processing unit configured to determine deviations in a fabrication process used to fabricate a sample with a layer having a periodic structure intended to cause a corresponding part of the layer to be fully reflective for light having a wavelength in a wavelength range and having an angle of incidence in an angle range from an output of the de
机译:考虑到上述情况,本发明的一个目的是提供一种检查工具和相应的方法,允许改进根据本发明的实施例的制造过程偏差的确定,提供了一种用于确定制造过程中的偏差的方法,包括以下步骤:a。使用具有使用制造过程制造的具有周期性结构的层的样品,并且旨在使层的相应部分充分反射,用于在波长范围内具有波长并且具有入射角的光。角度范围:b。用光波长范围的波长的光和角范围内的光的样品; C.C.Detecting光从样品层反射和/或散射;和D.从检测到的光线中的制造过程中的偏差。根据本发明的另一个实施方案,提供了一种用于校准制造过程的方法,包括以下步骤:A.省略根据本发明的方法,以确定制造过程中的偏差;并且B.根本基于制造过程中确定的偏差来调节制造工艺参数的校正信号。根据本发明的另一实施例,提供了一种检查工具,其包括:1.A用于保持样品的样品支架; 2.在样品保持器3.中照射样品的照明系统,用于检测反射光的检测系统从样品保持器中的样品散射:4.A处理单元,被配置为确定用于制造具有旨在使层的相应部分的具有周期性结构的层来制造样品的制造工艺中的偏差是完全反射光的在波长范围内具有波长并且具有从检测系统的输出的角度范围内的入射角,其中,照明系统被配置为发射波长范围内的波长并且具有角度的入射角发射光的光范围。根据本发明的又一个实施例,提供了一种制造系统,包括用于执行至少一部分的光刻设备根据本发明的制造工艺和检查工具。根据本发明的另一个实施例,提供了一种具有具有周期性结构的层的样品,该层旨在使层的相应部分充分反射,以便具有α的光波长范围的波长和角度范围内的入射角,其中,样品适合于根据本发明的方法或根据本发明的检查工具。根据本发明的另一实施例,在那里提供了一种用于确定制造过程中偏差的方法,包括以下步骤:a。提供具有使用制造过程制造的周期性结构的层的样品,并且旨在使层的相应部分完全反射,用于在波长范围内具有波长的光并且具有角度范围的入射角; B 。用具有波长范围的波长的光照射样品和角度范围内的入射角; C。检测透过样品的光;和d。从检测到的光线确定制造过程中的偏差。根据本发明的又一个实施例,提供了一种用于校准制造过程的方法,包括以下步骤:a。提供具有使用制造过程制造的周期性结构的层的样品,并且旨在使层的相应部分完全反射,用于在波长范围内具有波长的光并且具有角度范围的入射角; B 。用具有波长范围的波长的光照射样品和角度范围内的入射角; C。检测透过样品的光; d。从检测到的光线中确定制造过程中的偏差;和e。生成用于基于制造过程中所确定的偏差来调节制造工艺参数的校正信号。根据本发明的另一个实施例,提供了一种检查工具,其包括:1.A样品支架,用于保持样品; 2.照明用于照明样品架中的样品的系统; 3.一种检测系统,用于检测通过样品保持器中的样品传递的光; 4.一种处理单元,被配置为确定用于制造具有具有周期性结构的层的制造过程中的制造工艺中的偏差,该层旨在使层的相应部分完全反射在波长范围内的波长和具有波长的光从de输出的角度范围内的入射角

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    《Research Disclosure》 |2021年第687期|2074-2075|共2页
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  • 入库时间 2022-08-19 02:36:43

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