PATTERNING DEVICE CONDITIONING SYSTEM AND METHOD

摘要

A reticle conditioning system comprises: a support structure for supporting a reticle; a gas supply module for providing a flow of gas adjacent to the reticle; and a biasing module for controlling an electrical potential of the reticle. The gas supply module is operable to provide a flow of gas adjacent to the support structure. The biasing module comprises a first electrode, a second electrode and a voltage supply. The first and second electrodes are each spaced apart from and facing the reticle so as to at least partially overlap with the reticle. The voltage supply is arranged to maintain the first electrode at a positive voltage, and the second electrode at a negative voltage, these voltages being such that the voltage of the reticle is negative. The second electrode is disposed such that it, in use, it docs not overlap an image forming portion of the reticle.