Dual Short-Stroke with Shared Single Long Stroke: Control and Setpoint Strategies

摘要

A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). Driven by the growing demand of manufacturing modern integrated circuits with ever shrinking sizes, lithographic technologies that can offer higher resolution and heller reliability are under a fast-paced and extensive development. One of such advancing lithographic technologies is the extreme ultra-viotet lithography (also known as EUV or EUVL), which allows for sub-10 nanometer (nm) scale resolution. In lithographic processes, it is desirable frequently to make measurements of the structures created, e.g., for process control and verification.