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Raman Study of Defects in SI-GaAs and Se-doped Epitaxial Layer Irradiated by 10 MeV Electrons

机译:拉曼研究10 MeV电子辐照SI-GaAs和Se掺杂外延层中的缺陷

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摘要

Raman scattering measurements on Se-doped GaAs epitaxial layers and semi-insulating (SI) GaAs irradiated by 10 MeV electrons have been investigated. Several defect-related features were observed. We suggest that the 220 cm~(-1) mode is attribute to As_1 which is associated, at least in part, with EL2 and EL12 defects. For Se-doped samples, the Raman peaks at 205 and 258 cm~(-1) may be due to vibrational modes in small clusters of arsenic, and the 77,and 185 cm~(-1) modes are probably associated with disorder-activated first-order Raman scattering. Irradiated results show that the small clusters of arsenic and disorder state are increased with increasing irradiation fluences. Other Raman peaks will also be discussed in this paper.
机译:已经研究了掺杂Se的GaAs外延层和10 MeV电子辐照的半绝缘(SI)GaAs的拉曼散射测量。观察到一些与缺陷相关的特征。我们认为220 cm〜(-1)模式归因于As_1,它至少部分与EL2和EL12缺陷相关。对于掺硒样品,拉曼峰在205和258 cm〜(-1)处可能是由于小簇砷的振动模式引起的,而77和185 cm〜(-1)模式可能与无序相关。激活的一阶拉曼散射。辐照结果表明,随着辐照通量的增加,砷和无序状态的小簇也增加。其他拉曼峰也将在本文中讨论。

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