Deposition of Amorphous Carbon films using ECR Plasma by Varying the Substrate Temeprature

摘要

Amorphous hydrogenated carbon thin films have been deposited with benzence plasma in an electorn cyclotron resoance (ECR) plasma enhanced chemical vapor depostion system. The characteristic of Benzene discharge plasma has been monitored by Mass sepctrometry. It show that the majority of the plasma species in the downstream ECR plasma with benzene as gas soruce are acetylene, ethylene and hgiehr mass species. In the experiments, the effects of the substrate temeprature on the epostion rates have been emphatically studied. The structures of the films were analyzed by FTIR and Raman spectrum. The results show that when the substrae temeprature rises, the deposition rate drops down, the hydrogen content decreases, with the higher SP~3 content being presented in the film.