Effect of the Surface Bond States in as-Deposited DLC Films on the Incorporation of Nitrogen and Oxygen Atoms

摘要

We have investigated the relation of bonding states in as-deposited diamond-like carbon (DLC) films and the incorporation of N and O atoms into DLC films, following plasma treatment of the surface. After deposition with various coating methods and under different conditions, the DLC films were treated with $hbox{NH}_{3}$ or $ hbox{O}_{2}$ plasma. We investigated the changes in bonding states of the films using X-ray photoelectron spectroscopy (XPS). The results suggested that the incorporation due to plasma treatment was affected by the bonding states in the as-deposited DLC films. The C–H/C–C and the $hbox{sp}^{2}$ C–C/$hbox{sp}^{3}$ C–C ratios in the as-deposited DLC films play an important role in controlling N and O incorporation into the DLC films.