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首页> 外文期刊>Plasma Science, IEEE Transactions on >A Method to Maximize the Amplitude of Generated Terahertz Pulse From LT GaAs Photoconductive Semiconductor Switch
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A Method to Maximize the Amplitude of Generated Terahertz Pulse From LT GaAs Photoconductive Semiconductor Switch

机译:一种最大化LT GaAs光电导半导体开关产生的太赫兹脉冲幅度的方法

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摘要

The substrate characteristics of GaAs photoconductive switch has been studied in order to determine the conditions required to generate maximum terahertz pulse amplitude in the device. In particular, the substrate material characteristics, such as trap density, capture cross sections, trap occupancy that determine fields, recombination rate, and photogeneration that influence the pulse rise-time in a low temperature grown gallium arsenide semiinsulating material, are studied. Results show that maximum pulse amplitude occurs when the carriers of both polarities contribute to the terminal currents, and the voltage at this point is referred to as the dual injection voltage (DIV). DIV for a given device is directly dependent on the substrate properties as well as the proximity of the electrodes.
机译:为了确定在器件中产生最大太赫兹脉冲幅度所需的条件,已经研究了GaAs光电导开关的衬底特性。特别地,研究了在低温生长的砷化镓半绝缘材料中,诸如陷阱密度,捕获截面,确定电场的陷阱占有率,重组率和光生化等衬底材料特性,这些影响脉冲生长时间。结果表明,当两个极性的载流子都对端子电流起作用时,就会出现最大脉冲幅度,此时的电压称为双注入电压(DIV)。给定设备的DIV直接取决于衬底的属性以及电极的接近程度。

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