The Effect of O_2 in a Humid O_2/N_2/NO_X Gas Mixture on NO_X and N_2O Remediation by an Atmospheric Pressure Dielectric Barrier Discharge

摘要

A numerical model for N_xO_y remediation in humid air plasma produced with a dielectric barrier discharge at atmospheric pressure is presented. Special emphasis is given to NO_2 and N_2O reduction with the decrease of O_2 content in the feedstock gas. A detailed reaction mechanism including electronic and ionic processes, as well as the contribution of radicals and excited atomic/molecular species is proposed. The temporal evolution of the densities of NO, NO_2 and N_2O species, and some other by-products, is analyzed, and the major pathways for the N_xO_y remediation are discussed for one pulse. Subsequently, simulations are presented for a multi-pulses case, where three O_2 contents are tested for optimization of the remediation process. It is found that when the gas mixture O_2/N_2/ H_2O/NO_X has no initial O_2 content, the best NO_X and N_2O remediation is achieved.