首页> 外文期刊>Plasma Chemistry and Plasma Processing >Conversion of NO in NO/N2, NO/O2/N2, NO/C2H4/N2 and NO/C2H4/O2/N2 Systems by Dielectric Barrier Discharge Plasmas
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Conversion of NO in NO/N2, NO/O2/N2, NO/C2H4/N2 and NO/C2H4/O2/N2 Systems by Dielectric Barrier Discharge Plasmas

机译:NO转化为NO / N2 ,NO / O2 / N2 ,NO / C2 H4 / N2 和NO / C2 H4 / O2 / N2 系统

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摘要

An experimental study on the conversion of NO in the NO/N2, NO/O2/N2, NO/C2H4/N2 and NO/C2H4/O2/N2 systems has been carried out using dielectric barrier discharge (DBD) plasmas at atmospheric pressure. In the NO/N2 system, NO decomposition to N2 and O2 is the dominating reaction; NO conversion to NO2 is less significant. O2 produced from NO decomposition was detected by an on-line mass spectrometer. With the increase of NO initial concentration, the concentration of O2 produced decreases at 298 K, but slightly increases at 523 K. In the NO/O2/N2 system, NO is mainly oxidized to NO2, but NO conversion becomes very low at 523 K and over 1.6% of O2. In the NO/C2H4/N2 system, NO is reduced to N2 with about the same NO conversion as that in the NO/N2 system but without NO2 formation. In the NO/C2H4/O2/N2 system, the oxidation of NO to NO2 is dramatically promoted. At 523 K, with the increase of the energy density, NO conversion increases rapidly first, and then almost stabilizes at 93–91% of NO conversion with 61–55% of NO2 selectivity in the energy density range of 317–550 J L−1. It finally decreases gradually at high energy density. A negligible amount of N2O is formed in the above four systems. Of the four systems studied, NO conversion and NO2 selectivity of the NO/C2H4/O2/N2 system are the highest, and NO/O2/C2H4/N2 system has the lowest electrical energy consumption per NO molecule converted.
机译:NO / N2 ,NO / O2 / N2 ,NO / C2 H4 / N2 中NO转化的实验研究NO / C2 H4 / O2 / N2 系统是在大气压下使用电介质阻挡放电(DBD)等离子体进行的。在NO / N2 系统中,NO分解为N2 和O2 是主要反应。 NO转化为NO2 的意义不大。在线质谱仪检测到NO分解产生的O2 。随着NO初始浓度的增加,产生的O2 的浓度在298 K时降低,但在523 K时略有增加。在NO / O2 / N2 系统中,NO主要被氧化转化为NO2 ,但NO转化率非常低,为523 K,超过O2的1.6%。在NO / C2 H4 / N2 系统中,NO还原成N2 的NO转化率与NO / N2 系统中相同,但没有形成NO2 在NO / C2 H4 / O2 / N2 系统中,NO氧化为NO2 的能力大大增强。在523 K处,随着能量密度的增加,NO转化率首先迅速增加,然后在317–能量密度范围内几乎稳定在NO转化率的93–91%和NO2选择性为61–55%的情况下。 550 JL-1 。最终在高能量密度下逐渐减小。在上述四个体系中形成的N 2 O的量可以忽略不计。在所研究的四个系统中,NO / C2 H4 / O2 / N2 系统的NO转化率和NO2 选择性最高,NO / O2 / C2 H4 / N2 系统每转化一个NO分子的能耗最低。

著录项

  • 来源
    《Plasma Chemistry and Plasma Processing》 |2005年第4期|371-386|共16页
  • 作者单位

    Laboratory of Plasma Physical Chemistry Dalian University of Technology Box 288 Dalian 116024 China;

    Laboratory of Plasma Physical Chemistry Dalian University of Technology Box 288 Dalian 116024 China;

    Laboratory of Plasma Physical Chemistry Dalian University of Technology Box 288 Dalian 116024 China;

    Laboratory of Plasma Physical Chemistry Dalian University of Technology Box 288 Dalian 116024 China;

    Laboratory of Plasma Physical Chemistry Dalian University of Technology Box 288 Dalian 116024 China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    NO conversion; dielectric barrier discharge; plasma; NO2; C2H4;

    机译:NO转化介质阻挡放电等离子体NO2 C2H4;
  • 入库时间 2022-08-18 02:20:17

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