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Gas-phase and On-surface Chemical Reduction of CO2 to HCHO and CO under Dielectric Barrier Discharge

机译:介电势垒放电下CO 2气相和表面化学还原为HCHO和CO

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Selective chemical reduction of CO2(g) (with carrier Ar) in presence of organic compounds, either mixed in the gas-phase or present as a contact surface, under Dielectric Barrier Discharge is presented in this study. Along with gas-phase CO generation, added hydrocarbons (C n H 2n+x ; n = 6–12; x = 0 or 2) resulted in HCHO production with the maximum H-atom utilization efficiency being ∼15% of the total present. Product CO and HCHO were estimated separately by pre-concentration in specific absorber solutions followed by their discrete colorimetric measurements. On the other hand, in presence of various types of organic surfaces (e.g. wax, plastics and polymers, also acting simultaneously as a dielectric barrier), it was found that while CO could be estimated as above, in the ensuing chemical conversion, product HCHO was retained on these surfaces. On leaching the HCHO into the absorber solution, its production efficiency was estimated to be ∼5% of CO2.
机译:本研究提出了在介电势垒放电条件下,有机化合物在气相中混合或作为接触表面存在时,选择性还原CO 2(g)(与载体Ar)的方法。随着气相二氧化碳的产生,添加的碳氢化合物(C n H 2n + x ; n = 6–12; x = 0或2)导致HCHO的生产具有最大的H原子利用率约占总数的15%。通过在特定吸收剂溶液中进行预浓缩,然后进行离散比色法测量,分别估算了产品CO和HCHO。另一方面,发现在存在各种类型的有机表面(例如蜡,塑料和聚合物,也同时充当介电屏障)的情况下,虽然可以如上估算CO,但在随后的化学转化中,产物HCHO被保留在这些表面上。将HCHO浸入吸收剂溶液中时,其生产效率估计约为CO2的5%

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